• Semiconductor Alumina Ceramic Structural Parts,Semiconductor Alumina Ceramic Structural Parts, Alumina Ceramic Parts for Semiconductor, Precision Semiconductor Ceramics
  • Semiconductor Alumina Ceramic Structural Parts,Semiconductor Alumina Ceramic Structural Parts, Alumina Ceramic Parts for Semiconductor, Precision Semiconductor Ceramics

Semiconductor Alumina Ceramic Structural Parts

No.AlO_F

Product Name: Semiconductor Alumina Ceramic Structural Parts

Product Material: High-Purity Alumina Ceramic (Al₂O₃ ≥99.6%)

Material Characteristics:Excellent electrical insulation,High thermal conductivity (20-30W/m-K),Outstanding mechanical strength,High temperature resistance,Superior corrosion resistance

Application Fields:
Semiconductor manufacturing, Chip packaging and testing

Application Industries:
Wafer handling systems, Vacuum chucks, Probe stations

Processing Difficulties:

  • Micro-hole processing (aperture ≥0.1mm)

  • Thin-wall structure anti-deformation

  • High-precision dimensional control (±0.005mm)

Processing Flow:
Powder processing → Forming → Sintering → Precision machining → Inspection → Cleaning

Delivery Period:
30-35 days (depending on complexity)

  • Semiconductor Alumina Ceramic Structural Parts,Semiconductor Alumina Ceramic Structural Parts, Alumina Ceramic Parts for Semiconductor, Precision Semiconductor Ceramics

Description

Semiconductor alumina ceramic structural parts are high-precision ceramic components specifically developed for semiconductor manufacturing equipment. These components must operate in environments requiring high purity, cleanliness, and stability, with their performance directly impacting semiconductor production yield and efficiency. Our products utilize high-purity alumina ceramic material (≥99.6%) and undergo strict process control and precision machining technology to ensure excellent performance stability in high-temperature, high-electric field, and corrosive environments, meeting the stringent requirements of semiconductor equipment for precision, cleanliness, and reliability.

Key Features:

  • Ultra-Precision Machining: Capable of stable processing of micro-holes with diameter ≥0.1mm, hole position accuracy controlled within ±0.005mm, with aspect ratio up to 10:1, suitable for precision positioning and airflow channels.

  • Excellent Thermal Stability: Low coefficient of thermal expansion (approximately 7.2×10⁻⁶/°C), ensuring exceptional dimensional stability under rapid temperature changes.

  • Outstanding Mechanical Properties: High hardness (≥1600 HV) and high flexural strength (≥350 MPa), ensuring long-term stable operation under high-speed motion and stress.

  • Reliable Electrical Insulation: Dielectric strength ≥18 kV/mm, high volume resistivity (≥10¹⁴ Ω·cm), effectively ensuring safe operation of semiconductor equipment under high voltage conditions.

  • High Surface Quality and Cleanliness: Through precision grinding and polishing, surface roughness reaches Ra ≤0.2μm, with strict ultrasonic cleaning and clean packaging meeting the dust-free requirements of the semiconductor industry.

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